![[메모리반도체소자|2.5] #SRAM #reliability #HCI #NBTI #PBTI #RIF #soft error #SER](https://i.ytimg.com/vi/fo4Sgz3j5qs/maxresdefault.jpg)
![[기초반도체공정|0.0] #강의소개](https://i.ytimg.com/vi/PRZsD9m9JM4/maxresdefault.jpg)
![[기초반도체공정|1.1] #silicon #liquid chemical #gas](https://i.ytimg.com/vi/-CVEemHH46o/maxresdefault.jpg)
![[기초반도체공정|1.2] #vacuum #plasma](https://i.ytimg.com/vi/UF6D5r-Qyls/maxresdefault.jpg)
![[기초반도체공정|1.3] #cleanroom #contamination #사람이 제일 문제](https://i.ytimg.com/vi/Gmz0UKbH8sM/maxresdefault.jpg)
![[기초반도체공정|1.4] #RCA clean #megasonic](https://i.ytimg.com/vi/YTmsQcnxUXk/maxresdefault.jpg)
![[기초반도체공정|2.1] #oxidation #gate insulator #SiO2 #dangling bond #forming gas annealing](https://i.ytimg.com/vi/a4EkoGerI0Q/maxresdefault.jpg)
![[기초반도체공정|2.2] #oxidation kinetics #Deal-Grove model #oxidation 공정의 수학적 모델 #모델링은 어렵지 않아](https://i.ytimg.com/vi/TY6JiJaRvX8/maxresdefault.jpg)
![[기초반도체공정|2.3] #oxidation #현재는 안쓰는 이유 #gate oxide scaling #high-k metal gate](https://i.ytimg.com/vi/kpquQEFTd-E/maxresdefault.jpg)
![[기초반도체공정|3.1] #photolithography #전체 공정 요약](https://i.ytimg.com/vi/Csr33IuUIwk/maxresdefault.jpg)
![[기초반도체공정|3.2] #photolithography #light source #resolution #critical dimension #DOF](https://i.ytimg.com/vi/BnjT_Nr_Jvo/maxresdefault.jpg)
![[기초반도체공정|4.1] #etching #etch rate #profile #isotropic #anisotropic #selectivity #bias #uniformity](https://i.ytimg.com/vi/T6H-apNTAD4/maxresdefault.jpg)
![[기초반도체공정|4.2] #wet etching #dry etching #ion milling #RIE #Bosch process](https://i.ytimg.com/vi/hh_V8Gk9Zs8/maxresdefault.jpg)
![[기초반도체공정|5.1] #doping #diffusion #ion implantation #dose #projected range #channeling #RTA](https://i.ytimg.com/vi/GnDwUsllRpI/maxresdefault.jpg)
![[기초반도체공정|5.2] #sheet resistance #four point probe #Kelvin probe #secondary ion mass spectroscopy](https://i.ytimg.com/vi/BKgPWD_J_7M/maxresdefault.jpg)
![[기초반도체공정|6.1] #deposition #evaporation #thermal #e-beam #lift-off process](https://i.ytimg.com/vi/3swdlJ9CdZM/maxresdefault.jpg)
![[기초반도체공정|6.2] #deposition #sputtering #DC #RF #reactive ion #magnetron](https://i.ytimg.com/vi/Ozp_6kHgzB8/maxresdefault.jpg)
![[기초반도체공정|6.3] #deposition #CVD #LPCVD #PECVD](https://i.ytimg.com/vi/gXJC_T8JQCA/maxresdefault.jpg)
![[기초반도체공정|6.4] #deposition #ALD](https://i.ytimg.com/vi/URsOBG0l2hw/maxresdefault.jpg)
![[기초반도체공정|7.1] #metallization #interconnection #junction spike #electromigration #Damascene](https://i.ytimg.com/vi/gfcE3lQDLFk/maxresdefault.jpg)
[기초반도체공정|3.3] #photoresist #soft bake #alignment #PEB #develop #hard bake #PR strip
0
0
0 0·
11 Jan 2026
positive/negative PR 의 차이점에 대해 알아보고, photolithgraphy 전과정에 대해 자세히 알아봅니다.
0
0 0
sort 0
