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![[기초반도체공정|1.1] #silicon #liquid chemical #gas](https://i.ytimg.com/vi/-CVEemHH46o/maxresdefault.jpg)
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![[기초반도체공정|1.4] #RCA clean #megasonic](https://i.ytimg.com/vi/YTmsQcnxUXk/maxresdefault.jpg)
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![[기초반도체공정|2.2] #oxidation kinetics #Deal-Grove model #oxidation 공정의 수학적 모델 #모델링은 어렵지 않아](https://i.ytimg.com/vi/TY6JiJaRvX8/maxresdefault.jpg)
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![[기초반도체공정|3.1] #photolithography #전체 공정 요약](https://i.ytimg.com/vi/Csr33IuUIwk/maxresdefault.jpg)
![[기초반도체공정|3.2] #photolithography #light source #resolution #critical dimension #DOF](https://i.ytimg.com/vi/BnjT_Nr_Jvo/maxresdefault.jpg)
![[기초반도체공정|3.3] #photoresist #soft bake #alignment #PEB #develop #hard bake #PR strip](https://i.ytimg.com/vi/5Fq48YJKY2c/maxresdefault.jpg)
![[기초반도체공정|4.1] #etching #etch rate #profile #isotropic #anisotropic #selectivity #bias #uniformity](https://i.ytimg.com/vi/T6H-apNTAD4/maxresdefault.jpg)
![[기초반도체공정|4.2] #wet etching #dry etching #ion milling #RIE #Bosch process](https://i.ytimg.com/vi/hh_V8Gk9Zs8/maxresdefault.jpg)
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[기초반도체공정|1.3] #cleanroom #contamination #사람이 제일 문제
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11 Jan 2026
반도체 공정중 발생할 수 있는 오염원들(contamination)에 대해 알아보고, 클린룸(cleanroom)에 대한 기본 상식을 배워봅니다.
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